Invention Grant
- Patent Title: Device and system of a silicon controlled rectifier (SCR)
-
Application No.: US15206532Application Date: 2016-07-11
-
Publication No.: US09882003B1Publication Date: 2018-01-30
- Inventor: Efraim Aharoni
- Applicant: Tower Semiconductor Ltd.
- Applicant Address: IL Migdal Haemek
- Assignee: TOWER SEMICONDUCTOR LTD.
- Current Assignee: TOWER SEMICONDUCTOR LTD.
- Current Assignee Address: IL Migdal Haemek
- Agency: Shichrur & Co.
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/08 ; H01L29/49 ; H01L29/78 ; H01L27/02 ; H01L27/092

Abstract:
Some demonstrative embodiments include devices and/or systems of a Silicon Controlled Rectifier (SCR). For example, a silicon controlled rectifier (SCR) may include a metal-oxide-semiconductor field-effect transistor (MOSFET), the MOSFET may include a gate; an N-type source region; a non-Lightly Doped Drain (LDD) N-type drain region; and a P-Well region extending between the N-type source region and the non-LDD N-type drain region, and extending between the non-LDD N-type drain region and a drain region of the gate.
Public/Granted literature
- US20180012961A1 DEVICE AND SYSTEM OF A SILICON CONTROLLED RECTIFIER (SCR) Public/Granted day:2018-01-11
Information query
IPC分类: