Invention Grant
- Patent Title: Method for eliminating mask self-magnetization, substrate manufacturing method and mask testing device
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Application No.: US14744543Application Date: 2015-06-19
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Publication No.: US09885104B2Publication Date: 2018-02-06
- Inventor: Yan Wu , Yuedong Shang , Yongkai Wu , Jianbin Feng , Guoping Zhang , Junyu Li , Bo Zhang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Applicant Address: CN Beijing CN Ordos
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Ordos
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: CN201510104512 20150310
- Main IPC: C23C14/04
- IPC: C23C14/04 ; H01L51/00
Abstract:
Disclosed are a method for eliminating self-magnetization of a mask, a method for manufacturing a substrate and a mask testing device. The mask may include a plurality of metal stripes spaced from each other. The method may include a step of: energizing the mask, so as to enable the plurality of metal stripes to carry like charges, thereby separating every metal stripe from other adjacent metal stripes bonded together.
Public/Granted literature
- US20160268175A1 METHOD FOR ELIMINATING MASK SELF-MAGNETIZATION, SUBSTRATE MANUFACTURING METHOD AND MASK TESTING DEVICE Public/Granted day:2016-09-15
Information query
IPC分类:
