Invention Grant
- Patent Title: Dual-frequency grating interferometer displacement measurement system
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Application No.: US14441828Application Date: 2013-10-28
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Publication No.: US09885556B2Publication Date: 2018-02-06
- Inventor: Yu Zhu , Ming Zhang , Leijie Wang , Jinchun Hu , Longmin Chen , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Haihua Mu
- Applicant: TSINGHUA UNIVERSITY
- Applicant Address: CN Beijing
- Assignee: TSINGHUA UNIVERSITY
- Current Assignee: TSINGHUA UNIVERSITY
- Current Assignee Address: CN Beijing
- Priority: CN201210448734 20121109
- International Application: PCT/CN2013/086023 WO 20131028
- International Announcement: WO2014/071806 WO 20140515
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01D5/26 ; G01D5/38 ; G01B11/14

Abstract:
A dual-frequency grating interferometer displacement measurement system, comprises a dual-frequency laser, an interferometer, a measurement grating and an electronic signal processing component. The measurement system realizes displacement measurement based on grating diffraction, optical Doppler effect and optical beat frequency theory. Dual-frequency laser light is emitted from the dual-frequency laser and split into reference light and measurement light via a polarization spectroscope. The measurement light is incident to the measurement grating to generate positive and negative first-order diffraction. The diffraction light and the reference light form a beat frequency signal containing displacement information about two directions at a photo-detection unit, and linear displacement output is realized after signal processing. The measurement system can realize sub-nanometer and even higher resolution and accuracy, and is able to measure long horizontal displacement and vertical displacement at the same time.
Public/Granted literature
- US20150268031A1 DUAL-FREQUENCY GRATING INTERFEROMETER DISPLACEMENT MEASUREMENT SYSTEM Public/Granted day:2015-09-24
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