Invention Grant
- Patent Title: Apparatus and method for measuring reference spectrum for sample analysis, and apparatus and method for analyzing sample
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Application No.: US15241762Application Date: 2016-08-19
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Publication No.: US09885607B2Publication Date: 2018-02-06
- Inventor: Kun Sun Eom
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2015-0119044 20150824
- Main IPC: G01J3/42
- IPC: G01J3/42 ; G01J3/10 ; G01J3/02 ; G01J3/28

Abstract:
An apparatus for measuring a reference spectrum includes a parameter adjuster configured to adjust a parameter of a spectroscope so that an intensity of a reflection spectrum of a sample has a value in a range, a reference material spectrum measurer configured to adjust reflectance of a reference material so an intensity of a reflection spectrum of the reference material is not saturated, and measure the reflection spectrum of the reference material, using the spectroscope having the adjusted parameter, a first reference spectrum calculator configured to, in response to the adjusted reflectance of the reference material not being one hundred percent, calculate a first reference spectrum based on the measured reflection spectrum of the reference material, and a second reference spectrum measurer configured to measure a second reference spectrum of the reference material, using the spectroscope having the adjusted parameter, when a light source of the spectroscope is turned off.
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