Invention Grant
- Patent Title: Method of inspecting a substrate
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Application No.: US13977499Application Date: 2011-12-29
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Publication No.: US09885669B2Publication Date: 2018-02-06
- Inventor: Soo-Young Cho , Hee-Wook You , Bong-Ha Hwang , Hee-Tae Kim
- Applicant: Soo-Young Cho , Hee-Wook You , Bong-Ha Hwang , Hee-Tae Kim
- Applicant Address: KR Seoul
- Assignee: KOH YOUNG TECHNOLOGY INC.
- Current Assignee: KOH YOUNG TECHNOLOGY INC.
- Current Assignee Address: KR Seoul
- Agency: Kile Park Reed & Houtteman PLLC
- Priority: KR10-2010-0138104 20101229; KR10-2011-0143703 20111227
- International Application: PCT/KR2011/010316 WO 20111229
- International Announcement: WO2012/091494 WO 20120705
- Main IPC: G01B11/25
- IPC: G01B11/25 ; G01B11/06 ; G01N21/95 ; H05K13/08

Abstract:
A method of inspecting a substrate is disclosed. The method is performed by a substrate-inspecting apparatus having at least one projecting module projecting a patterned light onto a substrate fixed on a stage and an inspecting module with a camera capturing an image, and inspecting a plurality of inspection regions of the substrate step by step. The method comprises, setting an inspection order of the inspecting regions according to a lengthwise direction of the substrate, estimating height displacement of a target inspection region by using a tendency information regarding at least one previous inspection region that is already inspected, adjusting height of the inspecting module by using the estimated height displacement of the target inspection region, and inspecting the target inspection region by using the inspecting module of which height is adjusted. Therefore, inspection time is reduced.
Public/Granted literature
- US20140009601A1 METHOD OF INPSECTING A SUBSTRATE Public/Granted day:2014-01-09
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