Invention Grant
- Patent Title: Magnetic tunnel junction memory device
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Application No.: US15691099Application Date: 2017-08-30
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Publication No.: US09886990B2Publication Date: 2018-02-06
- Inventor: Chwen Yu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/16 ; H01L43/08 ; H01L27/22 ; G11C11/155 ; H01L43/02

Abstract:
Various memory devices are disclosed herein. An exemplary memory device includes a first electrode, a first magnetic layer disposed over the first electrode, a second magnetic layer disposed over the first magnetic layer, a barrier layer disposed between the first magnetic layer and the second magnetic layer, and a second electrode disposed over the second magnetic layer. The second electrode includes a magnetic assist region configured to produce a magnetic field that assists in aligning an orientation of a magnetic field of the second magnetic layer.
Public/Granted literature
- US20170365314A1 Magnetic Tunnel Junction Memory Device Public/Granted day:2017-12-21
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