Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US15176439Application Date: 2016-06-08
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Publication No.: US09887190B2Publication Date: 2018-02-06
- Inventor: Satoru Kameyama
- Applicant: Toyota Jidosha Kabushiki Kaisha
- Applicant Address: JP Toyota-Shi
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota-Shi
- Agency: Andrews Kurth Kenyon LLP
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L29/861 ; H01L21/265 ; H01L21/268 ; H01L29/66 ; H01L29/739 ; H01L29/08 ; H01L29/36 ; H01L29/10

Abstract:
A semiconductor device including a semiconductor substrate in which a diode region and an IGBT region are formed is provided. In the semiconductor device, the diode region includes a second conductivity type cathode layer. An impurity concentration of second conductivity type impurities of the cathode layer is distributed in a curve pattern having at least two peaks, and the impurity concentration of the second conductivity type impurities is higher than that of first conductivity type impurities at all depths of the cathode layer.
Public/Granted literature
- US20160284693A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-09-29
Information query
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