Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15307401Application Date: 2015-08-03
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Publication No.: US09887191B2Publication Date: 2018-02-06
- Inventor: Hiroshi Hata , Satoru Kameyama , Shinya Iwasaki
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota
- Agency: Oliff PLC
- Priority: JP2014-198483 20140929
- International Application: PCT/JP2015/071990 WO 20150803
- International Announcement: WO2016/051953 WO 20160407
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/06 ; H01L29/739 ; H01L29/861 ; H01L29/10

Abstract:
The re-combination center introduction region has re-combination centers introduced therein so that a density of the re-combination centers in the re-combination center introduction region is higher than a density of re-combination centers in a periphery of the re-combination center introduction region. The re-combination center introduction region continuously extends from the diode region to the peripheral region along a longitudinal direction of the diode region.
Public/Granted literature
- US20170263603A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-09-14
Information query
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