Invention Grant
- Patent Title: Semiconductor device including two-dimensional material, and method of manufacturing the semiconductor device
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Application No.: US14971019Application Date: 2015-12-16
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Publication No.: US09887303B2Publication Date: 2018-02-06
- Inventor: Jinseong Heo , Kiyoung Lee , Sangyeob Lee , Eunkyu Lee , Jaeho Lee , Seongjun Park
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2015-0069119 20150518
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L31/032 ; H01L29/16 ; H01L31/0352 ; H01L31/0224 ; H01L31/18 ; H01L27/144 ; H01L29/12 ; H01L29/24 ; H01L29/45 ; H01L29/66 ; H01L29/786

Abstract:
Example embodiments relate to semiconductor devices including two-dimensional (2D) materials, and methods of manufacturing the semiconductor devices. A semiconductor device may be an optoelectronic device including at least one doped 2D material. The optoelectronic device may include a first electrode, a second electrode, and a semiconductor layer between the first and second electrodes. At least one of the first electrode and the second electrode may include doped graphene. The semiconductor layer may have a built-in potential greater than or equal to about 0.1 eV, or greater than or equal to about 0.3 eV. One of the first electrode and the second electrode may include p-doped graphene, and the other may include n-doped graphene. Alternatively, one of the first electrode and the second electrode may include p-doped or n-doped graphene, and the other may include a metallic material.
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