• Patent Title: Electronic device and method for fabricating the same
  • Application No.: US15293079
    Application Date: 2016-10-13
  • Publication No.: US09887353B2
    Publication Date: 2018-02-06
  • Inventor: Wan-Gee Kim
  • Applicant: SK hynix Inc.
  • Applicant Address: KR Icheon
  • Assignee: SK HYNIX INC.
  • Current Assignee: SK HYNIX INC.
  • Current Assignee Address: KR Icheon
  • Priority: KR10-2016-0050568 20160426
  • Main IPC: H01L45/00
  • IPC: H01L45/00 H01L27/24
Electronic device and method for fabricating the same
Abstract:
An electronic device includes a semiconductor memory that includes: a first conductive pattern disposed over a substrate; a first selection element layer disposed over the first conductive pattern and having one or more first grooves therein, the first grooves overlapping the first conductive pattern; a first variable resistance layer whose sidewalls and bottom are surrounded by the first selection element layer, the first variable resistance layer being buried in the first groove; and a second conductive pattern that overlaps the first variable resistance layer and is disposed over the first variable resistance layer.
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