Invention Grant
- Patent Title: Electronic device and method for fabricating the same
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Application No.: US15293079Application Date: 2016-10-13
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Publication No.: US09887353B2Publication Date: 2018-02-06
- Inventor: Wan-Gee Kim
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon
- Assignee: SK HYNIX INC.
- Current Assignee: SK HYNIX INC.
- Current Assignee Address: KR Icheon
- Priority: KR10-2016-0050568 20160426
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
An electronic device includes a semiconductor memory that includes: a first conductive pattern disposed over a substrate; a first selection element layer disposed over the first conductive pattern and having one or more first grooves therein, the first grooves overlapping the first conductive pattern; a first variable resistance layer whose sidewalls and bottom are surrounded by the first selection element layer, the first variable resistance layer being buried in the first groove; and a second conductive pattern that overlaps the first variable resistance layer and is disposed over the first variable resistance layer.
Public/Granted literature
- US20170309815A1 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2017-10-26
Information query
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