A lithography device includes an eddy-current brake for damping the movement of a structural element of the lithography device. The eddy-current brake includes a plurality of magnets disposed in an arc-shaped arrangement, and a plurality of electrically conductive sheets arranged respectively between adjacent ones of the magnets. A relative movement between the magnets and the electrically conductive sheets in a direction to be damped inducing eddy currents in the electrically conductive sheets.