Invention Grant
- Patent Title: Resist composition, method of forming resist pattern, and polymeric compound
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Application No.: US14596532Application Date: 2015-01-14
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Publication No.: US09890233B2Publication Date: 2018-02-13
- Inventor: Miki Shinomiya , Tomoyuki Hirano , Kotaro Endo , Yuta Iwasawa
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2014-006140 20140116
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; C08F224/00 ; C08F228/06

Abstract:
A polymeric compound including a structural unit (a0) represented by general formula (a0-1) shown below and a polycyclic group-containing structural unit (a2m) other than the structural unit (a0), the structural unit (a2m) containing a lactone-containing polycyclic group, a —SO2-containing polycyclic group or a carbonate-containing polycyclic group, and a resist composition including the same: wherein R0 represents a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent, or a hydrogen atom; Ya0 represents a single bond or a divalent linking group; L represents an ester bond; and Ra0 represents a polycyclic group having a bridged ring polycyclic skeleton or a condensed ring polycyclic skeleton, which has in its skeleton —C(═O)O— or —SO2—, and at least one of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group.
Public/Granted literature
- US20150198880A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND Public/Granted day:2015-07-16
Information query
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