Invention Grant
- Patent Title: Method for producing mold for nanoimprinting and anti-reflective article
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Application No.: US14911413Application Date: 2014-08-08
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Publication No.: US09890466B2Publication Date: 2018-02-13
- Inventor: Shinya Shakagoori , Hiroshi Onomoto , Makoto Ookawa , Kazuya Takanashi , Katsumi Hara
- Applicant: Mitsubishi Rayon Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: JP2013-168539 20130814
- International Application: PCT/JP2014/071023 WO 20140808
- International Announcement: WO2015/022916 WO 20150219
- Main IPC: B29D11/00
- IPC: B29D11/00 ; C25D11/16 ; G02B1/118 ; B29C59/04 ; C25D11/08 ; C25D11/10 ; C25D11/12 ; G02B1/111 ; G02B27/00 ; G02B1/12 ; G02B5/02 ; B29C59/02 ; B29C33/38

Abstract:
This method for producing a mold for nanoimprinting in which a minute bumpy structure has been formed at the surface of a roller-shaped aluminum substrate of which the surface has been machined has: a polishing step for mechanically polishing the surface of the roller-shaped aluminum substrate, of which the surface has been machined, at least until the average crystal grain size changes; and a minute bumpy structure formation step for anodizing the aluminum substrate after the polishing step and forming a minute bumpy structure. The anti-reflective article has a minute bumpy structure at the surface, and in the wavelength region of visible light, has a color difference (E*) to the origin represented in the L*a*b* color system and derived by means of formula (1) of no greater than 0.9, or a chroma (C*) determined by means of formula (2) of no greater than 0.7. E*={(L*)2+(a*)2+(b*)2}1/2 (1) C*={(a*)2+(b*)2}1/2 (2)
Public/Granted literature
- US20160194778A1 METHOD FOR PRODUCING MOLD FOR NANOIMPRINTING AND ANTI-REFLECTIVE ARTICLE Public/Granted day:2016-07-07
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