Invention Grant
- Patent Title: Optical measurement system, measurement method for errors of rotating platform, and two dimensional sine wave annulus grating
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Application No.: US14960451Application Date: 2015-12-07
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Publication No.: US09891428B2Publication Date: 2018-02-13
- Inventor: Hsiu-An Tsai , Nai-Chun An
- Applicant: Metal Industries Research & Development Centre
- Applicant Address: TW Kaohsiung
- Assignee: Metal Industries Research & Development Centre
- Current Assignee: Metal Industries Research & Development Centre
- Current Assignee Address: TW Kaohsiung
- Agency: JCIPRNET
- Main IPC: G01D5/34
- IPC: G01D5/34 ; G02B26/08 ; G02B27/28 ; G02B5/30 ; G01D5/26 ; G01D5/347

Abstract:
An optical measurement system including a two-dimensional sine wave annuls grating and a measurement unit is provided. The two-dimensional sine wave annuls grating includes a rotary shaft and a plurality of sine wave structures surrounding the rotary shaft and continuously arranged. The measurement unit is adapted to output a light beam towards the two-dimensional sine wave annuls grating, wherein each of the sine wave structures is adapted to reflect the light beam from the two-dimensional sine wave annuls grating back to the measurement unit. A measurement method for errors of a rotating platform and a two-dimensional sine wave annuls grating are also provided.
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