Invention Grant
- Patent Title: Mask
-
Application No.: US14547399Application Date: 2014-11-19
-
Publication No.: US09891518B2Publication Date: 2018-02-13
- Inventor: Deshuai Wang , Lianjie Qu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201410345060 20140718
- Main IPC: G03F1/54
- IPC: G03F1/54 ; G03F1/00
Abstract:
A mask, comprising an opaque region, a first semi-transparent region, and a second semi-transparent region. The transmittance of the second semi-transparent region is less than that of the first semi-transparent region. The mask solves the over-etching problem caused by the difference between the thicknesses of photoresist in different regions.
Public/Granted literature
- US20160018726A1 MASK Public/Granted day:2016-01-21
Information query
