- Patent Title: Method and composition of a chemically amplified copolymer resist
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Application No.: US14812521Application Date: 2015-07-29
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Publication No.: US09891522B2Publication Date: 2018-02-13
- Inventor: Ya-Ling Cheng , Ching-Yu Chang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/32 ; G03F7/38 ; G03F7/16 ; G03F7/004 ; G03F7/00
Abstract:
The present disclosure provides a sensitive material. The sensitive material comprises a copolymer that includes polymer units including a hydrophobic unit; a hydrophilic unit comprising an acid generator; and a connection unit bonded between the hydrophobic unit and the hydrophilic unit, the connection unit comprising an acid-labile group.
Public/Granted literature
- US20160342087A1 Method and Composition of a Chemically Amplified Copolymer Resist Public/Granted day:2016-11-24
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