Invention Grant
- Patent Title: Conjugate common optical path lithography lens
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Application No.: US14740445Application Date: 2015-06-16
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Publication No.: US09891533B2Publication Date: 2018-02-13
- Inventor: Jiun-Woei Huang , Shih-Feng Tseng , Jer-Liang Yeh
- Applicant: National Applied Research Laboratories
- Applicant Address: TW Taipei
- Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
- Current Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
- Current Assignee Address: TW Taipei
- Agency: Jackson IPG PLLC
- Agent Demian K. Jackson
- Main IPC: G02B17/00
- IPC: G02B17/00 ; G03F7/20 ; G02B13/22 ; G02B17/08 ; G02B13/18

Abstract:
A conjugate common light path lithography lens set includes a first, second, third, and fourth spherical mirrors, arranged sequentially, a spherical reflecting mirror arranged below the fourth spherical mirror, a first and second planar reflecting mirrors, inclinedly arranged above the first spherical mirror, so that a conjugate telecentric component pattern is formed to maintain an pattern of an object to have a non-deformed pattern after experiencing these optical components. As such, the omni-spherical mirror set and two kinds of optical material are mutually arranged to form the novel conjugate common light path lithography lens set. This may further achieve the function of the lithography lens, and have a direct effect on the manufacturing cost. And, the efficacies of reduced component number, easier manufacture of the optical components (satisfied with the lens manufacturing's experience equation), easier calibration, reduced chromatic abberation, optimized aperature F/#, and a reduced cost may be achieved.
Public/Granted literature
- US20160370564A1 Conjugate Common Optical Path Lithography Lens Public/Granted day:2016-12-22
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |