- Patent Title: Projection optical system, exposure apparatus, and exposure method
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Application No.: US15151123Application Date: 2016-05-10
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Publication No.: US09891539B2Publication Date: 2018-02-13
- Inventor: Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-139344 20050512
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G02B1/06 ; G02B17/08 ; G02B21/33

Abstract:
An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
Public/Granted literature
- US09823588B2 Projection optical system, exposure apparatus, and exposure method Public/Granted day:2017-11-21
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