Invention Grant
- Patent Title: Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method
-
Application No.: US15504621Application Date: 2015-05-29
-
Publication No.: US09891540B2Publication Date: 2018-02-13
- Inventor: Earl William Ebert , Franciscus Godefridus Casper Bijnen
- Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- Current Assignee: ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2015/061928 WO 20150529
- International Announcement: WO2016/030031 WO 20160303
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; G03F9/00 ; G01B11/14

Abstract:
A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.
Public/Granted literature
- US20170235230A1 MEASURING METHOD, MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2017-08-17
Information query