Invention Grant
- Patent Title: Coil unit for thin film inductor, method of manufacturing coil unit for thin film inductor, thin film inductor, and method of manufacturing thin film inductor
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Application No.: US14822440Application Date: 2015-08-10
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Publication No.: US09892844B2Publication Date: 2018-02-13
- Inventor: Jeong Woo Park , Dong Min Kim
- Applicant: Samsung Electro-Mechanics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2014-0127618 20140924
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F27/28 ; H01F41/04
Abstract:
A coil unit for a thin film inductor includes an insulating material having double insulating layers of a first and a second insulating layers; and a plurality of coil patterns formed to be embedded in the insulating material. At least one coil pattern among the coil patterns has a thickness different from a thickness of rest of the coil patterns.
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