Invention Grant
- Patent Title: Semiconductor device and manufacturing method of semiconductor device
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Application No.: US15060505Application Date: 2016-03-03
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Publication No.: US09893036B2Publication Date: 2018-02-13
- Inventor: Koji Ogiso , Kazuhiro Murakami , Tatsuo Migita
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2015-110601 20150529
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L23/00 ; H01L23/48 ; H01L25/00 ; H01L23/522 ; H01L23/532

Abstract:
A semiconductor device includes a first substrate, an aluminum pad, a first nickel electrode, a second substrate, a second nickel electrode, and a connection layer. The first substrate includes a wiring therein. The aluminum pad is provided adjacent to a surface layer of the first substrate and is connected to the wiring. A portion of the first nickel electrode extends inwardly of the first substrate and is connected to the aluminum pad. A top surface of the first nickel electrode projects from a surface of the first substrate. A portion of the second nickel electrode extends inwardly of the second substrate. A top surface of the second nickel electrode projects from a surface of the second substrate facing the first substrate. The connection layer comprises an alloy including tin and connects the first nickel electrode and the second nickel electrode.
Public/Granted literature
- US20160351540A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE Public/Granted day:2016-12-01
Information query
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