Invention Grant
- Patent Title: Method for packaging a microelectronic device in a hermetically sealed cavity and managing the atmosphere of the cavity with a dedicated hole
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Application No.: US15101839Application Date: 2013-12-06
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Publication No.: US09908773B2Publication Date: 2018-03-06
- Inventor: Damien Saint-Patrice , Arnoldus Den Dekker , Marcel Giesen , Florent Greco , Gudrun Henn , Jean-Louis Pornin , Bruno Reig
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES , EPCOS AG
- Applicant Address: FR Paris DE Munich
- Assignee: Commissariat à l'énergie atomique et aux énergies alternatives,EPCOS AG
- Current Assignee: Commissariat à l'énergie atomique et aux énergies alternatives,EPCOS AG
- Current Assignee Address: FR Paris DE Munich
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/IB2013/002990 WO 20131206
- International Announcement: WO2015/082952 WO 20150611
- Main IPC: B81B1/00
- IPC: B81B1/00 ; B81C1/00 ; B81B7/00

Abstract:
A method for packaging a microelectronic device in an hermetically sealed cavity and managing an atmosphere of the cavity with a dedicated hole, including making said cavity between a support and a cap layer such that a sacrificial material and the device are arranged in the cavity; removing the sacrificial material through at least one release hole, and hermetically sealing the release hole; making a portion of wettable material on the cap layer, around a blind hole or a part of said outside surface corresponding to a location of said dedicated hole; making a portion of fuse material on the portion of wettable material; making the dedicated hole by etching the cap layer; and reflowing the portion of fuse material with a controlled atmosphere, forming a bump of fuse material which hermetically plugs said dedicated hole.
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