Invention Grant
- Patent Title: Film formation system and film formation method for forming metal film
-
Application No.: US14912234Application Date: 2014-08-20
-
Publication No.: US09909226B2Publication Date: 2018-03-06
- Inventor: Motoki Hiraoka , Hiroshi Yanagimoto , Yuki Sato
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota-shi, Aichi-ken
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota-shi, Aichi-ken
- Agency: Sughrue Mion, PLLC
- Priority: JP2013-170336 20130820
- International Application: PCT/IB2014/001567 WO 20140820
- International Announcement: WO2015/025211 WO 20150226
- Main IPC: C25D17/14
- IPC: C25D17/14 ; C25D5/04 ; C25D5/06 ; C25D5/22 ; C25D17/00 ; C25D5/08 ; C25D17/12 ; C25D21/04

Abstract:
A solid electrolyte membrane (13) is arranged on a surface of an anode (11) between the anode (11) and a substrate (B) that serves as a cathode. The solid electrolyte membrane (13) is brought into contact with the substrate (B). At the same time, a metal film (F) is formed on the surface of the substrate (B) by causing metal to precipitate onto the surface of the substrate (B) from metal ions through application of voltage between the anode (11) and the substrate (B) in a first contact state where the solid electrolyte membrane (13) contacts the substrate (B). The metal ions are contained inside the solid electrolyte membrane (13).
Public/Granted literature
- US20160201210A1 FILM FORMATION SYSTEM AND FILM FORMATION METHOD FOR FORMING METAL FILM Public/Granted day:2016-07-14
Information query