Invention Grant
- Patent Title: Method and apparatus for improving measurement accuracy
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Application No.: US15013348Application Date: 2016-02-02
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Publication No.: US09909983B2Publication Date: 2018-03-06
- Inventor: Nitesh Pandey
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- Priority: EP15154216 20150206
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01N21/47 ; G03F7/20

Abstract:
An optical system (10) includes an arrangement for splitting a source beam into a measurement beam and a reference beam. The reference beam is reflected off a reflective element (42) which mounted on a delay line (44). A target (35) scatters the radiation from the measurement beam. The scattered radiation and the reference beam are brought to interfere on a detector (40) by calibrating the delay line (44). The detected interference pattern is Fourier-transformed and filtered to select a region of interest around a side-band of the Fourier-transformed interference pattern in order to remove noise caused by stray radiation that hits the detector.
Public/Granted literature
- US20160231241A1 Method and Apparatus for Improving Measurement Accuracy Public/Granted day:2016-08-11
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