Invention Grant
- Patent Title: Exposure apparatus, exposure method, and device manufacturing method
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Application No.: US15628982Application Date: 2017-06-21
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Publication No.: US09910361B2Publication Date: 2018-03-06
- Inventor: Yuichi Shibazaki
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; G03F9/00

Abstract:
A movement area of a stage includes first-fifth areas. In the first area, three of four heads except for a first head respectively face three of four sections of a scale member except for a first section. In the second area, three of four heads except for a second head respectively face three of four sections except for a second section of the scale member. In the third area, three of four heads except for a third head respectively face three of four sections except for a third section of the scale member. In the fourth area, three of four heads except for a fourth head respectively face three of four sections of the scale member. In the fifth area, the four heads respectively face the four sections. During exposure, the stage is moved from one of the first-fourth areas to another of those areas via the fifth area.
Public/Granted literature
- US20170285485A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD Public/Granted day:2017-10-05
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