Invention Grant
- Patent Title: Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
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Application No.: US15416056Application Date: 2017-01-26
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Publication No.: US09910365B2Publication Date: 2018-03-06
- Inventor: Shinji Sato
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-227051 20121012
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/52 ; G03B27/68 ; G03F7/20

Abstract:
A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower surface opposing the substrate and second member disposed at a portion of exposure light optical path surrounding; driving apparatus to move the second member with respect to the first; controlling the driving apparatus so the second member's operation in the substrate first operation movement is between exposure termination and start of a first and second shot regions differently from a second member's operation in the substrate second movement period which is between exposure termination and start of a third and fourth shot regions; first and second shot regions are in the same row contrary to third and fourth shot regions.
Public/Granted literature
- US20170139331A1 EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM Public/Granted day:2017-05-18
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