A method for manufacturing a display device, according to an exemplary embodiment of the present inventive concept, includes forming a semiconductor of a transistor on a substrate, forming a gate insulating layer on the semiconductor, forming a control electrode and a first pad on the gate insulating layer, forming an interlayer insulating layer on the control electrode and the first pad, forming a first photosensitive film on the interlayer insulating, forming a plurality of first contact holes and a second contact hole by etching the interlayer insulating layer using the first photosensitive film patterns as a mask, removing a first portion of the interlayer insulating layer, forming a metal layer on the interlayer insulating layer, forming a second photosensitive film pattern on the metal layer, forming an input electrode and an output electrode, and removing the second photosensitive film pattern and a second portion of the interlayer insulating layer.