Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US15146980Application Date: 2016-05-05
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Publication No.: US09911860B2Publication Date: 2018-03-06
- Inventor: Kengo Akimoto , Toshinari Sasaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2008-281174 20081031
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L29/786 ; H01L27/12 ; H01L29/04 ; H01L29/24 ; H01L29/423 ; H01L29/45 ; H01L29/66

Abstract:
An object is to improve field effect mobility of a thin film transistor using an oxide semiconductor. Another object is to suppress increase in off current even in a thin film transistor with improved field effect mobility. In a thin film transistor using an oxide semiconductor layer, by forming a semiconductor layer having higher electrical conductivity and a smaller thickness than the oxide semiconductor layer between the oxide semiconductor layer and a gate insulating layer, field effect mobility of the thin film transistor can be improved, and increase in off current can be suppressed.
Public/Granted literature
- US20160247930A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-08-25
Information query
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