Invention Grant
- Patent Title: Alcohol assisted ALD film deposition
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Application No.: US14920001Application Date: 2015-10-22
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Publication No.: US09914995B2Publication Date: 2018-03-13
- Inventor: Feng Q. Liu , Mei Chang , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/02 ; C23C16/455 ; C23C16/04 ; C23C16/458
Abstract:
Methods of depositing a metal selectively onto a metal surface relative to a dielectric surface are described. Methods include reducing a metal oxide surface to a metal surface and protecting a dielectric surface to minimize deposition thereon and exposing the substrate to a metal precursor and an alcohol to deposit a film.
Public/Granted literature
- US20160145738A1 Alcohol Assisted ALD Film Deposition Public/Granted day:2016-05-26
Information query
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