Invention Grant
- Patent Title: Method for cultivating β-Ga2O3-based single crystal, and β-Ga2O3-based single crystal substrate and method for producing same
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Application No.: US14891513Application Date: 2014-05-02
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Publication No.: US09915010B2Publication Date: 2018-03-13
- Inventor: Kimiyoshi Koshi , Takekazu Masui , Masaru Takizawa
- Applicant: TAMURA CORPORATION , KOHA CO., LTD.
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: TAMURA CORPORATION,KOHA CO., LTD.
- Current Assignee: TAMURA CORPORATION,KOHA CO., LTD.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Priority: JP2013-102599 20130514
- International Application: PCT/JP2014/062199 WO 20140502
- International Announcement: WO2014/185304 WO 20141120
- Main IPC: C30B15/34
- IPC: C30B15/34 ; C30B29/16 ; C30B15/36

Abstract:
Provided is one embodiment which is a method for growing a β-Ga2O3-based single crystal which uses the EFG method and includes raising a Ga2O3 melt inside a crucible up to a die opening via a die slit such that a seed crystal is contacted with the Ga2O3-based melt in the opening of the die with a horizontal position of the seed crystal shifted in a width direction (W) from a center in the width direction (W) of the die, and pulling up the seed crystal contacting the Ga2O3-based melt so as to grown a β-Ga2O3 single crystal.
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