Invention Grant
- Patent Title: Measuring system and measuring method
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Application No.: US15190182Application Date: 2016-06-23
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Publication No.: US09915519B2Publication Date: 2018-03-13
- Inventor: Qiang Wu , Yuntao Jiang
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN Shanghai
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN Shanghai
- Agency: Anova Law Group, PLLC
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G02B27/14 ; G02B27/00 ; G02B5/00 ; G01B11/27

Abstract:
System and method for measuring an aerial image are provided. The system may include a lighting unit for providing illuminating light to pass through a mask to form initial light. An imaging unit is configured for imaging the initial light to form imaging light. A beam splitting unit is for splitting the imaging light into projection light and reference light. A projection light is projected to a substrate to form a mask image in the substrate, and the substrate reflects the projection light to form first reflected light onto the beam splitting unit. A reflecting unit is for receiving the reference light to form second reflected light, and for projecting the second reflected light onto the beam splitting unit, the second reflected light and the first reflected light interfering with each other to form interference light. A measuring unit is for measuring an aerial image formed from the interference light.
Public/Granted literature
- US20170370698A1 MEASURING SYSTEM AND MEASURING METHOD Public/Granted day:2017-12-28
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