Invention Grant
- Patent Title: Paste for diffusion layer formation and production method thereof and production method of gas diffusion layer
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Application No.: US14897415Application Date: 2014-09-19
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Publication No.: US09916915B2Publication Date: 2018-03-13
- Inventor: Tohru Oda
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota-shi, Aichi-ken
- Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee Address: JP Toyota-shi, Aichi-ken
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2013-196895 20130924
- International Application: PCT/IB2014/001882 WO 20140919
- International Announcement: WO2015/044736 WO 20150402
- Main IPC: H01B1/18
- IPC: H01B1/18 ; H01B1/24 ; H01M4/86 ; H01M4/88 ; C09D11/52 ; H05K1/02 ; H05K1/09 ; H01M8/023 ; H01M8/1018 ; H01M8/0232 ; H01M8/0234

Abstract:
The paste for diffusion layer formation used for formation of a GDL for a fuel cell contains a solvent, and conductive particles, a first surfactant having a first decomposition temperature and a second surfactant having a second decomposition temperature that is lower than the first decomposition temperature, all of which are dispersed in the solvent. The paste for diffusion layer formation contains a lower amount of the first surfactant than the second surfactant on a weight basis.
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