Invention Grant
- Patent Title: Semiconductor device manufacturing method
-
Application No.: US14248020Application Date: 2014-04-08
-
Publication No.: US09917010B2Publication Date: 2018-03-13
- Inventor: Hideaki Yoshimi , Mitsuo Umemoto , Kazumi Onda , Kazumi Horinaka
- Applicant: Semiconductor Components Industries, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Phoenix
- Agent Robert F. Hightower
- Priority: JP2006-091170 20060329
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/367

Abstract:
A semiconductor device includes: a semiconductor substrate; a heat sink mounted on an upper surface of the semiconductor substrate; wirings formed on a lower surface of the semiconductor substrate; and the like. The heat sink is mounted on the upper surface of the semiconductor substrate, and a planar size thereof is approximately the same as that of the semiconductor substrate. Moreover, the heat sink has a thickness of 500 μm to 2 mm, and may be formed to be thicker than the semiconductor substrate. By using the heat sink to reinforce the substrate, a thickness of the semiconductor substrate can be reduced to, for example, about 50 μm. As a result, a thickness of the entire semiconductor device can be reduced.
Public/Granted literature
- US20140220739A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD Public/Granted day:2014-08-07
Information query
IPC分类: