Method and apparatus with channel stop doped devices
Abstract:
Methods and apparatuses relate to implanting a surface of a semiconductor substrate with dopants, making undoped semiconductor material directly on the surface implanted with the dopants, and making a transistor with a transistor channel in the undoped semiconductor material, such that the transistor channel of the transistor remains undoped throughout manufacture of the integrated circuit.
Public/Granted literature
Information query
Patent Agency Ranking
0/0