Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US15515465Application Date: 2014-12-24
-
Publication No.: US09917026B2Publication Date: 2018-03-13
- Inventor: Ryuichi Oikawa , Toshihiko Ochiai , Shuuichi Kariyazaki , Yuji Kayashima , Tsuyoshi Kida
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Koutou-ku, Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Koutou-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- International Application: PCT/JP2014/084108 WO 20141224
- International Announcement: WO2016/103359 WO 20160630
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/14 ; H01L23/498 ; H01L25/065 ; H01L23/66

Abstract:
A semiconductor device includes first and second semiconductor components mounted on an interposer mounted on a wiring substrate, and electrically connected to each other via the interposer. Also, a plurality of wiring layers of the interposer include first, second and third wiring layers which are stacked in order from a main surface side to be a reference. In addition, in a first region of the interposer sandwiched between the first semiconductor component and the second semiconductor component, a ratio of a reference potential wiring in the third wiring layer is higher than a ratio of a reference potential wiring in the first wiring layer. Further, in the first region, a ratio of a signal wiring in the first wiring layer is higher than a ratio of a signal wiring in the third wiring layer.
Public/Granted literature
- US20170213776A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-07-27
Information query
IPC分类: