Invention Grant
- Patent Title: Semiconductor memory device and manufacturing the same
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Application No.: US15228378Application Date: 2016-08-04
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Publication No.: US09917098B2Publication Date: 2018-03-13
- Inventor: Jun Fujiki , Takeshi Kamigaichi , Hideaki Aochi
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/148
- IPC: H01L27/148 ; H01L29/80 ; H01L27/108 ; H01L21/00 ; H01L27/11582 ; H01L27/11556 ; H01L29/16 ; H01L29/04 ; H01L29/45 ; H01L29/417 ; H01L23/532 ; H01L21/28 ; H01L21/02 ; H01L27/11519 ; H01L27/11565

Abstract:
One embodiment includes a plurality of memory cells and a plurality of conducting layers. The memory cells are three-dimensionally disposed on a semiconductor substrate. The conducting layers are disposed in a laminating direction. Each of the plurality of the conducting layers is connected to each of the plurality of the memory cells. Each conducting layer has a structure where a first conductive film and a second conductive film are laminated in the laminating direction. The conducting layers adjacent to one another in the laminating direction have a laminating order of the first conductive film and the second conductive film different from one another.
Public/Granted literature
- US20170200734A1 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING THE SAME Public/Granted day:2017-07-13
Information query
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