Invention Grant
- Patent Title: Thin film transistor, manufacturing method thereof, array substrate and display apparatus
-
Application No.: US14770369Application Date: 2014-11-21
-
Publication No.: US09917203B2Publication Date: 2018-03-13
- Inventor: Chunsheng Jiang , Lung Pao Hsin
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Collard & Rose, P.C.
- Priority: CN201410381242 20140805
- International Application: PCT/CN2014/091912 WO 20141121
- International Announcement: WO2016/019654 WO 20160211
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/786 ; H01L21/02 ; H01L21/425 ; H01L21/441 ; H01L21/768 ; H01L23/522 ; H01L27/12 ; H01L29/06 ; H01L29/24 ; H01L29/66

Abstract:
A thin film transistor, a manufacturing method thereof, an array substrate and a display apparatus are disclosed. The manufacturing method includes forming a gate electrode (2), a gate insulating layer (3), an active region (4), a source electrode (5) and a drain electrode (6) on a base substrate (1) with the active region being formed of ZnON material, and implanting the active region (4) with nitrogen ion while it being formed, so as to make the sub-threshold swing amplitude of the thin film transistor less than or equal to 0.5 mV/dec. The manufacturing method reduces the sub-threshold swing amplitude of the thin film transistor and improves the semiconductor characteristics of the thin film transistor.
Public/Granted literature
- US20160043228A1 THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY APPARATUS Public/Granted day:2016-02-11
Information query
IPC分类: