Invention Grant
- Patent Title: Mask for depositing a thin film and a thin film deposition method using the same
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Application No.: US15139435Application Date: 2016-04-27
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Publication No.: US09931661B2Publication Date: 2018-04-03
- Inventor: Woong-Sik Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2013-0068637 20130614
- Main IPC: B05D1/32
- IPC: B05D1/32 ; B05B15/04 ; C23C14/04
Abstract:
A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern bars to a plurality of positions to modify the deposition pattern.
Public/Granted literature
- US20160236222A1 MASK FOR DEPOSITING A THIN FILM AND A THIN FILM DEPOSITION METHOD USING THE SAME Public/Granted day:2016-08-18
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