Invention Grant
- Patent Title: Substrate mark detection apparatus and substrate mark detection method
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Application No.: US15170493Application Date: 2016-06-01
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Publication No.: US09931675B2Publication Date: 2018-04-03
- Inventor: Yangkun Jing
- Applicant: BOE Technology Group Co., Ltd. , Hefei BOE Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Beijing CN Hefei
- Assignee: BOE Technology Group Co., Ltd.,Hefei BOE Optoelectronics Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Hefei BOE Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Hefei
- Agency: Banner & Witcoff, Ltd.
- Priority: CN201510299662 20150603
- Main IPC: G01N21/88
- IPC: G01N21/88 ; B07C5/342 ; G01N21/958 ; G01N21/896

Abstract:
A substrate mark detection apparatus includes: a detecting module, configured to detect a depth at which a mark is embedded in a substrate to be detected and determine whether the substrate is valid or not according to the depth at which the mark is embedded in the substrate; an information extracting module, configured to parse the mark to obtain parsed information in a case where the substrate is valid, query pre-stored information corresponding to the mark, determine whether the parsed information conforms to the pre-stored information or not, and if yes, to extract the pre-stored information and output the pre-stored information; a sorting module, configured to remove the substrate in a case where the substrate is invalid or the parsed information does not conform to the pre-stored information.
Public/Granted literature
- US20160354808A1 Substrate Mark Detection Apparatus and Substrate Mark Detection Method Public/Granted day:2016-12-08
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