Invention Grant
- Patent Title: Pretreatment solution for electroless plating and electroless plating method
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Application No.: US15122548Application Date: 2015-06-11
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Publication No.: US09932676B2Publication Date: 2018-04-03
- Inventor: Masahiro Ito , Yuichi Adachi
- Applicant: ELECTROPLATING ENGINNERS OF JAPAN LIMITED
- Applicant Address: JP Tokyo
- Assignee: ELECTROPLATING ENGINEERS OF JAPAN LIMITED
- Current Assignee: ELECTROPLATING ENGINEERS OF JAPAN LIMITED
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2014-146991 20140717
- International Application: PCT/JP2015/066849 WO 20150611
- International Announcement: WO2016/009753 WO 20160121
- Main IPC: C23C18/18
- IPC: C23C18/18 ; C23C18/16 ; C23C18/30 ; C23C18/32 ; C23C18/42 ; C23C18/44 ; C23C18/31

Abstract:
The pretreatment solution for electroless plating of the present invention is composed of noble metal colloidal nanoparticles, a sugar alcohol, and water. The colloidal nanoparticles are gold, platinum, or palladium, have an average particle diameter of 5 to 80 nm, and are contained in the pretreatment solution in an amount of 0.01 to 10 g/L as metal mass. The sugar alcohol is at least one selected from the group consisting of tritol, tetritol, pentitol, hexitol, heptitol, octitol, inositol, quercitol, or pentaerythritol and is contained in the pretreatment solution in an amount of 0.01 to 200 g/L in total. The electroless plating method of the present invention uses the pretreatment solution and performs the electroless plating in an electroless plating bath.
Public/Granted literature
- US20170067164A1 PRETREATMENT SOLUTION FOR ELECTROLESS PLATING AND ELECTROLESS PLATING METHOD Public/Granted day:2017-03-09
Information query
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