Invention Grant
- Patent Title: Gas supply control device
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Application No.: US15233965Application Date: 2016-08-11
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Publication No.: US09933086B2Publication Date: 2018-04-03
- Inventor: Mao-Chang Ho
- Applicant: Acw Tech Co., Ltd. , FU I SHIN ENTERPRISE CO., LTD.
- Applicant Address: TW Kaohsiung TW Kaohsiung
- Assignee: ACW TECH CO., LTD.,FU I SHIN ENTERPRISE CO., LTD.
- Current Assignee: ACW TECH CO., LTD.,FU I SHIN ENTERPRISE CO., LTD.
- Current Assignee Address: TW Kaohsiung TW Kaohsiung
- Agent Leong C. Lei
- Priority: TW105208456U 20160604
- Main IPC: F16K1/32
- IPC: F16K1/32 ; F16K31/44

Abstract:
A gas supply control device includes a main body, a control valve assembly extending into and received in the main body, a bottom lid attached to a bottom surface of the main body, and a top cover attached to a top surface of the main body. The gas supply control device provides an effect of simplicity and accuracy of gas supply therethrough.
Public/Granted literature
- US20170350530A1 GAS SUPPLY CONTROL DEVICE Public/Granted day:2017-12-07
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