Invention Grant
- Patent Title: Semiconductor workpiece temperature measurement system
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Application No.: US15198701Application Date: 2016-06-30
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Publication No.: US09933314B2Publication Date: 2018-04-03
- Inventor: Klaus Petry , Jason M. Schaller , Ala Moradian , Morgan D. Evans
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Agency: Nields, Lemack & Frame, LLC
- Main IPC: G01K5/48
- IPC: G01K5/48 ; G01B11/00 ; H05B1/02 ; H05B3/00 ; H01J37/317

Abstract:
An improved system and method of measuring the temperature of a workpiece being processed is disclosed. The temperature measurement system determines a temperature of a workpiece by measuring the amount of expansion in the workpiece due to thermal expansion. The amount of expansion may be measured using a number of different techniques. In certain embodiments, a light source and a light sensor are disposed on opposite sides of the workpiece. The total intensity of the signal received by the light sensor may be indicative of the dimension of the workpiece. In another embodiment, an optical micrometer may be used. In another embodiment, a light sensor may be used in conjunction with a separate device that measures the position of the workpiece.
Public/Granted literature
- US20180003567A1 Semiconductor Workpiece Temperature Measurement System Public/Granted day:2018-01-04
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