Invention Grant
- Patent Title: Inspection apparatus
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Application No.: US14516490Application Date: 2014-10-16
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Publication No.: US09933370B2Publication Date: 2018-04-03
- Inventor: Masaaki Ito , Hisashi Hatano
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Volpe and Koenig, P.C.
- Priority: JP2013-215934 20131017
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/88 ; G01N21/95 ; G01N21/956

Abstract:
When a size of a block on a wafer is equal to or smaller than an optical resolution of imaging optics, room for improvement in a signal-to-noise ratio has not been sufficiently considered in a conventional technique. One feature of the defect determination of the present invention is to include a filter processing for setting a predetermined partial area serving as a predetermined matrix for a first difference image, scanning the first difference image in the partial area, and outputting a second difference image, and a first threshold processing using a first threshold value for the second difference image. As a result, highly sensitive defect detection can be achieved.
Public/Granted literature
- US20150109435A1 INSPECTION APPARATUS Public/Granted day:2015-04-23
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