Invention Grant
- Patent Title: Photonic crystal structure and method of fabricating the same
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Application No.: US15698309Application Date: 2017-09-07
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Publication No.: US09933567B2Publication Date: 2018-04-03
- Inventor: Cheolmin Park , Han Sol Kang
- Applicant: UNIVERSITY-INDUSTRY FOUNDATION (UIF), YONSEI UNIVERSITY
- Applicant Address: KR Seoul
- Assignee: UNIVERSITY-INDUSTRY FOUNDATION (UIF), YONSEI UNIVERSITY
- Current Assignee: UNIVERSITY-INDUSTRY FOUNDATION (UIF), YONSEI UNIVERSITY
- Current Assignee Address: KR Seoul
- Priority: KR10-2016-0115510 20160908
- Main IPC: G02B6/028
- IPC: G02B6/028 ; G02B6/12 ; G02B6/122 ; G02B6/02 ; G02F1/313 ; C08F212/08 ; B82Y20/00
Abstract:
Provided is a photonic crystal structure and the photonic crystal structure includes a polymer structure layer including a first polymer domain and a second polymer domain; and a photonic crystal material designed to be reversibly bonded to at least a portion of the first polymer domain to adjust a degree of swelling of the first polymer domain, thereby reflecting a light of a certain wavelength.
Public/Granted literature
- US20180067258A1 PHOTONIC CRYSTAL STRUCTURE AND METHOD OF FABRICATING THE SAME Public/Granted day:2018-03-08
Information query
