Invention Grant
- Patent Title: Photobase generator
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Application No.: US15100503Application Date: 2014-11-17
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Publication No.: US09933701B2Publication Date: 2018-04-03
- Inventor: Takuya Ikeda , Atsushi Shiraishi
- Applicant: SAN APRO LTD.
- Applicant Address: JP Kyoto
- Assignee: SAN APRO LTD.
- Current Assignee: SAN APRO LTD.
- Current Assignee Address: JP Kyoto
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2013-250937 20131204
- International Application: PCT/JP2014/005755 WO 20141117
- International Announcement: WO2015/083331 WO 20150611
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07F5/02 ; C07F9/06 ; C07C279/04 ; C07D487/04 ; C07F9/572 ; C07D233/54 ; C07D335/16 ; C07D409/06 ; G03F7/038 ; C07D233/58 ; C07D233/60

Abstract:
Provided are a photobase generator having higher sensitivity to light than do conventional photobase generators, and a photosensitive resin composition containing the photobase generator. The present invention is a photobase generator characterized in containing a salt represented by general formula (1). (In formula (1), R1-R4 are mutually independent groups represented by general formula (2), C1-18 alkyl groups, or Ar, with at least one being a group represented by general formula (2); in formula (2), (D) is a divalent group bonded on at least one side to elemental boron, and Ar1 is the same as the aforementioned Ar; and Q+ is a monovalent onium cation.)
Public/Granted literature
- US20160299429A1 PHOTOBASE GENERATOR Public/Granted day:2016-10-13
Information query
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