Invention Grant
- Patent Title: Photolithographic illuminator device enabling controlled diffraction
-
Application No.: US14430896Application Date: 2013-09-25
-
Publication No.: US09933703B2Publication Date: 2018-04-03
- Inventor: Bertrand Plainchamp , Renaud Mercier Ythier
- Applicant: SAGEM DEFENSE SECURITE , SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
- Applicant Address: FR Boulogne-Billancourt CN Shanghai
- Assignee: SAGEM DEFENSE SECURITE,SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee: SAGEM DEFENSE SECURITE,SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee Address: FR Boulogne-Billancourt CN Shanghai
- Agency: Womble Bond Dickinson (US) LLP
- Priority: FR1259004 20120925
- International Application: PCT/EP2013/069984 WO 20130925
- International Announcement: WO2014/049001 WO 20140403
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20 ; G02B27/09
Abstract:
The invention relates to a photolithographic illuminator device including: a light beam source, a condenser (5), an optical homogenizing system (4) including at least one microlens array, said system being arranged upstream from the condenser, and a shutter (3) arranged at the object focal point of the optical homogenizing system, the illuminator being characterized in that same further comprises a network of aperture diaphragms (8) arranged in the Fourier transform plane of the shutter plane (3). The invention likewise relates to a photolithographic device including such an illuminator.
Public/Granted literature
- US20150248063A1 PHOTOLITHOGRAPHIC ILLUMINATOR DEVICE ENABLING CONTROLLED DIFFRACTION Public/Granted day:2015-09-03
Information query
