Invention Grant
- Patent Title: Reduction projection optical system, exposure apparatus, and exposure method
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Application No.: US14227726Application Date: 2014-03-27
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Publication No.: US09933705B2Publication Date: 2018-04-03
- Inventor: Yasuhiro Omura
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Morrison & Foerster LLP
- Priority: JP2003-128154 20030506; JP2003-350647 20031009; JP2003-364596 20031024
- Main IPC: G02B17/00
- IPC: G02B17/00 ; G03F7/20 ; G02B9/34 ; G02B17/08 ; H01L21/027

Abstract:
A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.
Public/Granted literature
- US09904174B2 Reduction projection optical system, exposure apparatus, and exposure method Public/Granted day:2018-02-27
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |