Invention Grant
- Patent Title: Optical apparatus for use in photolithography
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Application No.: US13279368Application Date: 2011-10-24
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Publication No.: US09933707B2Publication Date: 2018-04-03
- Inventor: Yim-Bun Patrick Kwan , Erik Loopstra
- Applicant: Yim-Bun Patrick Kwan , Erik Loopstra
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: GrayRobinson, P.A.
- Agent Donald S. Showalter
- Priority: DE10350546.6 20031029
- Main IPC: G02B7/02
- IPC: G02B7/02 ; G03F7/20 ; G02B5/00 ; G02B13/14

Abstract:
An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.
Public/Granted literature
- US20120194793A1 OPTICAL APPARATUS FOR USE IN PHOTOLITHOGRAPHY Public/Granted day:2012-08-02
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |