Invention Grant
- Patent Title: Projection exposure method and projection exposure apparatus
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Application No.: US15470007Application Date: 2017-03-27
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Publication No.: US09933710B2Publication Date: 2018-04-03
- Inventor: Stephan Andre , Daniel Golde , Toralf Gruner , Johannes Ruoff
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102016205617 20160405
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/68 ; G03F7/20 ; G03F9/00
Abstract:
A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens
Public/Granted literature
- US20170285493A1 PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS Public/Granted day:2017-10-05
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