Invention Grant
- Patent Title: Method for manufacturing p-type zinc oxide film
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Application No.: US15346831Application Date: 2016-11-09
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Publication No.: US09934968B2Publication Date: 2018-04-03
- Inventor: Masaki Tanemura , Morimichi Watanabe , Jun Yoshikawa , Tsutomu Nanataki
- Applicant: NAGOYA INSTITUTE OF TECHNOLOGY , NGK INSULATORS, LTD.
- Applicant Address: JP Nagoya JP Nagoya
- Assignee: Nagoya Institute of Technology,NGK Insulators, Ltd.
- Current Assignee: Nagoya Institute of Technology,NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya JP Nagoya
- Agency: Burr & Brown, PLLC
- Priority: JP2014-102384 20140516
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C14/32 ; H01J37/32 ; C23C14/08 ; C23C14/22 ; C23C14/58 ; C23C14/00

Abstract:
There is provided a production method which enables stable formation of a p-type zinc oxide film and also is suitable for enlarging the area of the film. The method for producing a p-type zinc oxide film according to the present invention comprises the steps of: placing a target containing a zinc source and a substrate in a gas atmosphere containing a nitrogen source and an oxygen source and having a gas pressure of 0.1 Pa to 100 Pa, and exposing the target to arc discharge, thereby forming a precursor film containing zinc and oxygen on the substrate; and annealing the precursor film in an oxidizing atmosphere, thereby forming a p-type zinc oxide film.
Public/Granted literature
- US20170053801A1 METHOD FOR MANUFACTURING P-TYPE ZINC OXIDE FILM Public/Granted day:2017-02-23
Information query
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